- Title
- Chemical instability of graphene oxide following exposure to highly reactive radicals in advanced oxidation processes
- Creator
- Wang, Zhaohui; Sun, Linyan; Lou, Xiaoyi; Yang, Fei; Feng, Min; Liu, Jianshe
- Relation
- Journal of Colloid and Interface Science Vol. 507, p. 51-58
- Publisher Link
- http://dx.doi.org/10.1016/j.jcis.2017.07.105
- Publisher
- Academic Press
- Resource Type
- journal article
- Date
- 2017
- Description
- The rapidly increasing and widespread use of graphene oxide (GO) as catalyst supports, requires further understanding of its chemical stability in advanced oxidation processes (AOPs). In this study, UV/H₂O₂ and UV/persulfate (UV/PS) processes were selected to test the chemical instability of GO in terms of their performance in producing highly reactive hydroxyl radicals (OH) and sulfate radicals (SO·₄¯), respectively. The degradation intermediates were characterized using UV-visible absorption spectra (UV-vis), X-ray photoelectron spectroscopy (XPS), transmission electron microscopy (TEM), Raman spectroscopy, and matrix-assisted laser desorption and ionization time-of-flight mass spectrometry (MALDI-TOF-MS). Experimental data indicate that UV/PS process was more effective in enhancing GO degradation than the UV/H₂O₂ system. The overall oxygen-containing functionalities (e.g. CO, CO and OCO groups) dramatically declined. After radical attack, sheet-like GO was destructed into lots of flakes and some low-molecular-weight molecules were detected. The results suggest GO is most vulnerable against SO·₄¯ radical attack, which deserves special attention while GO acts as a catalyst support or even as a catalyst itself. Therefore, stability of GO and its derivatives should be carefully assessed before they are applied to SO·₄¯-based AOPs.
- Subject
- graphene oxide; sulfate radical; hydroxyl radical; decomposition; advanced oxidation processes
- Identifier
- http://hdl.handle.net/1959.13/1385234
- Identifier
- uon:32187
- Identifier
- ISSN:0021-9797
- Language
- eng
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